MC-1200 Pulse Acid Copper Plating Additive

Product Introduction

  •  Fine-grained, high-ductility copper deposit with excellent thickness uniformity.

  • Ideal for High Aspect Ratio (HAR) of 24:1 or greater; Throwing Power (TP) reaches 95%.

  • Ductility and tensile strength fully comply with industry standards for PCB and ceramic substrates.

  • Superior performance in both Blind Via Filling (BVH) and Through-Hole (TH) plating.

  • Resolves thickness uniformity issues inherent in DC plating; significantly reduces copper consumption.

  • Suitable for AI Backplanes and high-density multi-layer HDI boards for GPUs (thickness ≥ 5mm).

Applicable Aspect Ratio > 24:1

Uniform Thickness Sistribution

Suitable for High-level HDI PCB

The additive fully complies with the RoHS regulations, containing no lead, cadmium, mercury, hexavalent chromium, PBB, or PBDE.

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